Soft-x-ray fluorescence study of buried silicides in antiferromagnetically coupled Fe/Si multilayers

被引:35
|
作者
Carlisle, JA
Chaiken, A
Michel, RP
Terminello, LJ
Jia, JJ
Callcott, TA
Ederer, DL
机构
[1] UNIV TENNESSEE, KNOXVILLE, TN 37996 USA
[2] TULANE UNIV, NEW ORLEANS, LA 70118 USA
关键词
D O I
10.1103/PhysRevB.53.R8824
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Soft-x-ray fluorescence spectroscopy has been employed to obtain information about the Si-derived valence-band states of Fe/Si multilayers. The valence-band spectra are quite different for films with and without antiferromagnetic interlayer exchange coupling, demonstrating that these multilayers have different silicide phases in their spacer layers. Comparison with previously published fluorescence data on bulk iron silicides shows that the Fe concentration in the silicide spacer layers is substantial. Near-edge x-ray-absorption data on antiferromagnetically coupled multilayers in combination with the fluorescence data demonstrate unambiguously that the silicide spacer layer in these films is metallic. These results on the electronic structure of buried layers in a multilayer film exemplify the wide range of experiments made possible by high-brightness synchrotron sources.
引用
收藏
页码:R8824 / R8827
页数:4
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