High-current plasma lens: Role of aberrations

被引：0
|
作者：
Goncharov, A [1 ]
Dobrovolsky, A [1 ]
Litovko, I [1 ]
Protsenko, I [1 ]
Zadorodzny, V [1 ]
机构：
[1] NASU,INST PHYS,UA-252650 KIEV 39,UKRAINE
来源：
ISDEIV - XVIITH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, PROCEEDINGS, VOLS I AND II | 1996年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：570 / 573
页数：4
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