Development of a particle detection system for phase-shifting masks

被引：0
|
作者：
Shishido, H [1 ]
Matsumoto, S [1 ]
Kenbo, Y [1 ]
Hoga, M [1 ]
Koizumi, Y [1 ]
机构：
[1] HITACHI LTD,PROD ENGN RES LAB,TOTSUKA KU,YOKOHAMA,KANAGAWA 244,JAPAN
来源：
OPTICAL MICROLITHOGRAPHY IX | 1996年 / 2726卷
关键词：
particle; spatial filtering; phase-shifting mask; inspection;
D O I：
10.1117/12.240920
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：485 / 495
页数：11
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