共 50 条
- [1] Linewidth measurement based on automatically matched and stitched AFM images [J]. FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007, 2007, 931 : 407 - +
- [2] Estimation of AFM Tip Shape and Status in Linewidth and Profile Measurement [J]. INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2, 2010, : 150 - 151
- [3] Direct measurement of the linewidth of relief element on AFM in nanometer range [J]. MICRO- AND NANOELECTRONICS 2007, 2008, 7025
- [4] AFM measurement of linewidth with sub-nanometer scale precision [J]. Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3, 2005, 5752 : 156 - 162
- [6] Development of photomask linewidth measurement and calibration using AFM and SEM in NMIJ [J]. SCANNING MICROSCOPIES 2011: ADVANCED MICROSCOPY TECHNOLOGIES FOR DEFENSE, HOMELAND SECURITY, FORENSIC, LIFE, ENVIRONMENTAL, AND INDUSTRIAL SCIENCES, 2011, 8036
- [7] Study of an image stitching method for linewidth measurement [J]. PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI, 2004, 5446 : 776 - 783
- [9] An image stitching method to eliminate the distortion of the sidewall in linewidth measurement [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 : 363 - 373