Infra-red, X-ray photoelectron spectroscopy and electrical studies of r.f. sputtered amorphous silicon carbide films

被引：3
|
作者：
Han, LJ
Ong, TY
Prakash, S
Chua, LG
Choi, WK
Tan, LS
Loh, FC
Tan, KL
机构：
[1] Natl Univ Singapore, Dept Elect Engn, Microelect Lab, Singapore 119260, Singapore
[2] Natl Univ Singapore, Dept Phys, Surface Sci Lab, Singapore 119260, Singapore
来源：
THIN SOLID FILMS | 1999年 / 343卷
关键词：
annealing; FTIR; amorphous silicon carbide; sputtering; X-ray photoelectron spectroscopy;
D O I：
10.1016/S0040-6090(98)01660-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effects of furnace and rapid thermal annealing (RTA) on the electrical and structural properties of r.f. sputtered amorphous silicon carbide films were investigated. It was found that RTA has a similar effect on the structural properties of our films as compared with furnace annealing. The conductance results showed that the effect of annealing on the interface trapped charge density (D-it) for the unhydrogenated films can be explained using the conclusion obtained from the infra-red (IR) and X-ray photoelectron spectroscopy (XPS) results. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：441 / 444
页数：4
相关论文
共 50 条
  • [41] X-RAY PHOTOELECTRON-SPECTROSCOPY AND AUGER-SPECTROSCOPY STUDIES OF THIN SILICON-NITRIDE FILMS THERMALLY GROWN ON SILICON
    SOBOLEWSKI, MA
    HELMS, CR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1358 - 1362
  • [42] Electrostatic immobilization of polyoxometallates on silicon: X-ray Photoelectron Spectroscopy and electrochemical studies
    Fleury, Benoit
    Billon, Martial
    Duclairoir, Florence
    Dubois, Lionel
    Fanton, Aurelien
    Bidan, Gerard
    THIN SOLID FILMS, 2011, 519 (11) : 3732 - 3738
  • [43] ELECTRONIC-STRUCTURE OF HYDROGENATED AMORPHOUS-SILICON GERMANIUM ALLOYS STUDIES BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND SOFT-X-RAY SPECTROSCOPY
    SENEMAUD, C
    ARDELEAN, I
    JOURNAL OF PHYSICS-CONDENSED MATTER, 1990, 2 (44) : 8741 - 8750
  • [44] X-RAY AND INFRA-RED STUDIES OF BICYCLO(2.2.2)OCTANE TRIETHYLENEDIAMINE AND QUINUCLIDINE .I. X-RAY STUDIES OF BICYCLO(2.2.2)OCTANE AND QUINUCLIDINE
    BRUESCH, P
    SPECTROCHIMICA ACTA, 1966, 22 (05): : 861 - &
  • [45] X-ray photoelectron spectroscopy and X-ray diffraction studies on tin sulfide films grown by sulfurization process
    Reddy, M. V.
    Babu, P.
    Reddy, K. T. Ramakrishna
    Miles, R. W.
    JOURNAL OF RENEWABLE AND SUSTAINABLE ENERGY, 2013, 5 (03)
  • [46] X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES ON AMORPHOUS TBFECO ALLOY AND POLYCARBONATE INTERFACE
    YOROZU, T
    HIRANO, M
    OKA, K
    SATOH, T
    IEEE TRANSACTIONS ON MAGNETICS, 1986, 22 (05) : 1218 - 1220
  • [47] INTERFACE STUDY OF HYDROGENATED AMORPHOUS-SILICON NITRIDE ON HYDROGENATED AMORPHOUS-SILICON BY X-RAY PHOTOELECTRON-SPECTROSCOPY
    BEAUDOIN, M
    ARSENAULT, CJ
    IZQUIERDO, R
    MEUNIER, M
    APPLIED PHYSICS LETTERS, 1989, 55 (25) : 2640 - 2642
  • [48] X-ray photoelectron spectroscopy characterization of radio frequency reactively sputtered carbon nitride thin films
    Kumar, S
    Butcher, KSA
    Tansley, TL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (05): : 2687 - 2692
  • [49] X-Ray photoelectron spectroscopy characterization of reactively sputtered Ti-B-N thin films
    Lu, YH
    Zhou, ZF
    Sit, P
    Shen, YG
    Li, KY
    Chen, H
    SURFACE & COATINGS TECHNOLOGY, 2004, 187 (01): : 98 - 105
  • [50] X-ray photoelectron spectroscopy investigation of magnetron sputtered Mg-Ti-H thin films
    Jensen, I. J. T.
    Thogersen, A.
    Lovvik, O. M.
    Schreuders, H.
    Dam, B.
    Diplas, S.
    INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 2013, 38 (25) : 10704 - 10715
12345