Study of hysteresis behavior of charges in fluorinated polyimide film by using capacitance-voltage method

被引：4
|
作者：
Lee, YK [1 ]
机构：
[1] Adonbest Technol Inc, W Vancouver, BC V7S 1C8, Canada
来源：
MODERN PHYSICS LETTERS B | 2006年 / 20卷 / 08期
关键词：
hysteresis; capacitance-voltage; fluorinated polyimide; interlayer dielectric; ULSI; flat band voltage;
D O I：
10.1142/S0217984906010858
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The hysteresis behavior of charges was observed in Capacitance-Voltage (C-V) curve characteristics of fluorinated polyimide film in MPS (Cu-fluorinated polyimide film-Si) test structure. The degree of hysteresis was almost constant up to 150 degrees C and then sharply increased beyond 150 degrees C. Hysteresis behavior up to 150 degrees C was due to a fixed amount of mobile charges at the interface between fluorinated polyimide film and Si and one beyond 150 degrees C was due to abrupt increase of mobile charges and their enhanced movement in the bulk of fluorinated polyimide film due to structural transition of fluorinated polyimide film.
引用
收藏
页码：445 / 449
页数：5
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