Unified analysis and mathematical representation of film-thickness behavior of film-substrate systems

被引:10
|
作者
Zaghloul, ARM
Yousef, MSA
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Ellipsometry Res & Applicat Lab, Savannah, GA 31407 USA
[2] ITR Technol Inc, Lincoln, NE 68508 USA
关键词
D O I
10.1364/AO.45.000235
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The ellipsometric function rho of a film-substrate system is studied as the film thickness d is kept constant and the angle of incidence phi is changed. The generated constant-thickness contours (CTCs) are characterized by an introduced mathematical behavior indicator that represents a group of CTCs. The behavior of each group is developed and studied in the four planes phi-d, X, Z, and rho, where X is the film-thickness exponential function and Z is a previously introduced intermediate plane. In the phi-d plane the film-thickness domain is identified and divided into a sequence of disconnected thickness subdomains (DTSs), depending on only N-0 and N-1, and their number depending on the range in which N-0/N-1 lies. The behavior of the CTCs in the successive planes X, Z, and rho is then studied in each DTS, and the CTC's space is divided into disconnected subfamilies according to the behavior indicator. Equivalence classes that reduce the infinite number of subfamilies into a finite number are then introduced. The transformation from each plane to the next is studied with the origin of the Z plane mapped onto the point at x of the p plane, forming a singularity. A multiple-film-thickness inequality is derived to determine the unique solution of the film thickness. The type of reflection being internal or external at both ambient-film and film-substrate interfaces affects the analysis and is also considered. To conclude we introduce the design of polarization-preserving devices and a novel oscillating single-element ellipsometer to fully characterize zero film-substrate systems as examples of applying the knowledge developed here. (c) 2006 Optical Society of America.
引用
收藏
页码:235 / 264
页数:30
相关论文
共 50 条
  • [1] Peridynamic fracture analysis of film-substrate systems
    Chu, Shiyuan
    Bai, Jinshuai
    Zhao, Zi-Long
    Liu, Yan
    Huang, Dan
    Li, Bo
    Li, Qunyang
    Feng, Xi-Qiao
    JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS, 2024, 191
  • [2] Film-thickness error analysis of optical disk systems
    Wang, Y.
    Gu, D.H.
    Gan, F.X.
    Chinese Journal of Lasers B (English Edition), 2001, 10 (03): : 206 - 210
  • [3] Film-thickness Error Analysis of Optical Disk Systems
    WANG Yang GU Donghong GAN Fuxi (Shanghai Institute of Optics and Fine Mechanics
    Chinese Journal of Lasers, 2001, (03) : 47 - 51
  • [4] Delamination behavior of film-substrate systems under cyclic loading
    Liao, K
    Wan, KT
    JOURNAL OF MATERIALS SCIENCE LETTERS, 2000, 19 (01) : 57 - 59
  • [5] FILM-THICKNESS MEASUREMENTS
    COLLIER, JG
    HEWITT, GF
    MECHANICAL ENGINEERING, 1965, 87 (03) : 78 - &
  • [6] Influence of film thickness on deformation of a free magnetostrictive film-substrate system
    Zhang, WX
    Peng, B
    Jiang, HC
    Yang, SQ
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2002, 247 (01) : 111 - 116
  • [7] FILM-THICKNESS MONITOR
    PATTEN, RA
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1971, 61 (05) : 665 - &
  • [8] Research on fracture behavior of film-substrate system
    Liu, Baoliang
    Bi, Xianshun
    CMESM 2006: PROCEEDINGS OF THE 1ST INTERNATIONAL CONFERENCE ON ENHANCEMENT AND PROMOTION OF COMPUTATIONAL METHODS IN ENGINEERING SCIENCE AND MECHANICS, 2006, : 556 - 560
  • [10] Mechanical properties of thin film-substrate systems
    Simunková, S
    Bláhová, O
    Stepánek, I
    JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2003, 133 (1-2) : 189 - 194