The influence of the concentration of adenine (AD) on the corrosion and the spontaneous dissolution of copper in 1.0 M NaCl solutions of pH 6.8 was studied. The investigations involved electrochemical polarization methods as well as weight loss measurements, quartz crystal microbalance (QCM) techniques and scanning electron microscopy (SEM). The inhibition efficiency increases with an increase in the concentration of AD. An adherent layer of inhibitor is postulated to account for the protective effect. The adsorption of adenine has been found to occur on the surface of copper according to the Langmuir isotherm. The values of standard free energies of adsorption suggest chemical adsorption of AD on copper surface. The use of adenine can effectively prevent various new installations made of copper and exposed to the action of aqueous solutions of chlorides from corrosion damage. (C) 2008 Elsevier Ltd. All rights reserved.
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Princess Nora Bint Abdulrahman Univ, Dept Chem, Fac Sci, Riyadh, Saudi ArabiaAin Shams Univ, Fac Educ, Dept Chem, Electrochem Res Lab, Cairo, Egypt
Al-Mobarak, N. A.
Khaled, K. F.
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Ain Shams Univ, Fac Educ, Dept Chem, Electrochem Res Lab, Cairo, Egypt
Taif Univ, Fac Sci, Dept Chem, Mat & Corros Lab, At Taif 888, Hawiya, Saudi ArabiaAin Shams Univ, Fac Educ, Dept Chem, Electrochem Res Lab, Cairo, Egypt
Khaled, K. F.
Hamed, Mohamed N. H.
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Ain Shams Univ, Fac Educ, Dept Chem, Cairo, EgyptAin Shams Univ, Fac Educ, Dept Chem, Electrochem Res Lab, Cairo, Egypt
Hamed, Mohamed N. H.
Abdel-Azim, K. M.
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Ain Shams Univ, Fac Educ, Dept Chem, Electrochem Res Lab, Cairo, EgyptAin Shams Univ, Fac Educ, Dept Chem, Electrochem Res Lab, Cairo, Egypt