Effective attenuation lengths of low energy electrons in MgO thin films

被引:4
|
作者
Iacobucci, S. [1 ]
Offi, F. [2 ]
Torelli, P. [3 ]
Petaccia, L. [4 ]
机构
[1] Univ Roma Tre, Dipartimento Sci, ISM, CNR, Via Vasca Navale 84, I-00146 Rome, Italy
[2] Univ Roma Tre, Dipartimento Sci, Via Vasca Navale 84, I-00146 Rome, Italy
[3] CNR, Ist Officina Mat, TASC Lab, Str Statale 14 Km 163-5, I-34149 Trieste, Italy
[4] Elettra Sincrotrone Trieste, Str Statale 14 Km 163-5, I-34149 Trieste, Italy
关键词
Effective attenuation lenght (EAL); Inelastic mean free path (IMFP); Universal curve; Low energy electrons; Low energy photoemission spectroscopy (PES); MgO; Dielectric function; MEAN FREE PATHS; PHOTOELECTRON-SPECTROSCOPY; SURFACE SENSITIVITY; IONIZATION; SCATTERING; DEPTH;
D O I
10.1016/j.elspec.2019.03.002
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
The effective attenuation length (EAL) of electrons in MgO films has been measured in the (5.5-28) eV energy range by the over-layer method and correlated with the band structure of the material. As expected, the EAL is found to increase when the electron energy is decreased, but the obtained values are smaller than those predicted by the universal curve. The comparison of the experimental results with calculated optical properties available in the literature suggests that, for energies lower than 20 eV, the relevant scattering mechanisms are described by the imaginary part of the dielectric function, accounting in particular for the steep increase of the EAL for energies smaller than the insulator band gap.
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页码:1 / 4
页数:4
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