Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer

被引:26
|
作者
Tavakkoli, Amir K. G. [3 ,4 ]
Hannon, Adam F. [1 ]
Gotrik, Kevin W. [1 ]
Alexander-Katz, Alfredo [1 ]
Ross, Caroline A. [1 ]
Berggren, Karl K. [2 ,4 ]
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] Delft Univ Technol, Kavli Inst Nanosci, Delft, Netherlands
[3] NUS Grad Sch Integrat Sci & Engn NGS, Singapore 117456, Singapore
[4] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
基金
美国国家科学基金会;
关键词
block copolymers; hybrid patterns; templated self-assembly; graphoepitaxy; square patterns; ORDERED SQUARE ARRAYS; LITHOGRAPHY; PATTERNS; ALIGNMENT; POLYMERS; SURFACES;
D O I
10.1002/adma.201104895
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Using an array of majority-block-functionalized posts makes it possible to locally control the self-assembly of a block copolymer and achieve several morphologies on a single substrate. A template consisting of a square symmetry array of posts produces a square-symmetry lattice of microdomains, which doubles the areal density of features.
引用
收藏
页码:4249 / +
页数:7
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