Atomic Force Microscopy Study of the Kinetic Roughening in Nanostructured Gold Films on SiO2

被引:44
|
作者
Ruffino, F. [1 ]
Grimaldi, M. G. [1 ]
Giannazzo, F. [2 ]
Roccaforte, F. [2 ]
Raineri, V. [2 ]
机构
[1] Univ Catania, MATIS, CNR, INFM,Dipartimento Fis & Astron, I-95123 Catania, Italy
[2] CNR, Ist Microelettron & Microsistemi, I-95121 Catania, Italy
来源
NANOSCALE RESEARCH LETTERS | 2009年 / 4卷 / 03期
关键词
Dynamic scaling behavior; Kinetic roughening; Atomic force microscopy; Gold; SiO2; X-RAY REFLECTIVITY; GROWTH; SURFACE; SILVER; ADSORPTION; CONTINUUM;
D O I
10.1007/s11671-008-9235-0
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Dynamic scaling behavior has been observed during the room-temperature growth of sputtered Au films on SiO2 using the atomic force microscopy technique. By the analyses of the dependence of the roughness, sigma, of the surface roughness power, P(f), and of the correlation length, xi, on the film thickness, h, the roughness exponent, alpha = 0.9 +/- A 0.1, the growth exponent, beta = 0.3 +/- A 0.1, and the dynamic scaling exponent, z = 3.0 +/- A 0.1 were independently obtained. These values suggest that the sputtering deposition of Au on SiO2 at room temperature belongs to a conservative growth process in which the Au grain boundary diffusion plays a dominant role.
引用
收藏
页码:262 / 268
页数:7
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