UV laser photolysis of butenedial from 193 to 450 nm

被引：0
|
作者：
Tang, YX
Zhu, L
机构：
[1] SUNY Albany, Dept Environm Hlth & Toxicol, New York State Dept Hlth, Albany, NY 12201 USA
[2] New York State Dept Hlth, Wadsworth Ctr, New York, NY USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 230卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：U2905 / U2905
页数：1
相关论文
共 50 条
  • [1] Photolysis of butenedial at 193, 248, 280, 308, 351, 400, and 450 nm
    Tang, YX
    Zhu, L
    CHEMICAL PHYSICS LETTERS, 2005, 409 (4-6) : 151 - 156
  • [2] PHOTOLYSIS OF POLYCYTIDYLIC ACID ON 193 NM LASER EXCITATION
    GORNER, H
    GURZADYAN, GG
    JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 1993, 71 (02) : 155 - 160
  • [3] IONIZATION OF PURINES AND THEIR NUCLEOSIDES BY 193 NM LASER PHOTOLYSIS
    CANDEIAS, LP
    STEENKEN, S
    INTERNATIONAL JOURNAL OF RADIATION BIOLOGY, 1990, 58 (05) : 889 - 889
  • [4] Laser radiometry for UV lasers at 193 nm
    Kück, S
    Liegmann, K
    Möstl, K
    Brandt, F
    Metzdorf, J
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2002 AND 7TH INTERNATIONAL WORKSHOP ON LASER BEAM AND OPTICS CHARACTERIZATION, 2003, 4932 : 645 - 655
  • [5] Laser damage of optical coatings from UV to deep UV at 193nm.
    Dijon, J
    Quesnel, E
    Pellé, C
    Thielsch, R
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1998, 1999, 3578 : 54 - 63
  • [6] THE PHOTOLYSIS OF ETHYLENE AT 193 NM
    GIROUX, L
    BACK, MH
    BACK, RA
    CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1989, 67 (07): : 1166 - 1173
  • [7] Photolysis of Disilane at 193 nm
    Tada, N
    Tonokura, K
    Matsumoto, K
    Koshi, M
    Miyoshi, A
    Matsui, H
    JOURNAL OF PHYSICAL CHEMISTRY A, 1999, 103 (02): : 322 - 329
  • [8] UV LASER PHOTOCHEMISTRY OF ACETYLENE AT 193NM
    IRION, MP
    KOMPA, KL
    APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1982, 27 (04): : 183 - 186
  • [9] LASER MULTIPHOTON IONIZATION SPECTRUM OF ALCH3 RADICALS FORMED BY UV EXCIMER LASER PHOTOLYSIS OF GASEOUS TMA AT 248 NM AND 193 NM
    ZHANG, Y
    STUKE, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (07): : L1349 - L1351
  • [10] Laser multiphoton ionization spectrum of AlCH3 radicals formed by UV excimer laser photolysis of gaseous TMA at 248 nm and 193 nm
    Zhang, Y.
    Stuke, M.
    Japanese Journal of Applied Physics, Part 2: Letters, 1988, 27 (07):
12345