Excimer-laser crystallization of Si films via bi-directional irradiation of dual-layer films on transparent substrates

被引：0
|
作者：
Yoon, JH [1 ]
Im, JS [1 ]
机构：
[1] COLUMBIA UNIV,DEPT CHEM ENGN MAT SCI & MIN ENGN,NEW YORK,NY 10027
来源：
ADVANCED LASER PROCESSING OF MATERIALS - FUNDAMENTALS AND APPLICATIONS | 1996年 / 397卷
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：453 / 458
页数：6
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