Electronic properties of HfXY intermetallic compounds (X = Si, Ge; Y = S, Se, Te)

被引:0
|
作者
Yaar, I. [1 ]
Halevy, I. [1 ]
Kahane, S. [1 ]
Beck, A. [1 ]
Berant, Z. [1 ]
机构
[1] Nucl Res Ctr Negev, IL-84190 Beer Sheva, Israel
来源
HYPERFINE INTERACTIONS | 2007年 / 176卷 / 1-3期
关键词
efg; Cu(2)Sb-type; LAPW; hyperfine interaction;
D O I
10.1007/s10751-008-9631-y
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
The electric field gradient (efg) parameters were calculated for the ternary system HfXY (X = Si, Ge; Y = S, Se, Te), using the full-potential linear augmented plane wave (LAPW) method applying the generalized gradient approximation (GGA). The major contribution to the efg value in these compounds comes from the p-p contribution next to the probe nucleus. The intermetallic compounds HfXY (X = Si, Ge; Y = S, Se, Te) show similar electronic properties. This similarity can be attributed to the resemblance of the crystallographic structure and the alike electronic structure of the X and Y ligand atoms, having two and four p-electrons in the external orbital, respectively.
引用
收藏
页码:27 / 31
页数:5
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