The photolithographic and electric properties of photosensitive insulating materials as a passivation layer on TFT LCDs

被引:0
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作者
Nakamura, Shigeru [1 ]
Azuma, Kenichi [1 ]
Kusaka, Yasunari [1 ]
Unate, Takao [1 ]
Nakasuga, Akira [1 ]
Matsukawa, Kimihiro
Murakami, Shuichi
Ohkura, Kensaku
Kikkawa, Takamaro
机构
[1] Sekisui Chem Co Ltd, Minase Res Labs, Shimamoto, Osaka 6188589, Japan
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Novel photosensitive insulating materials comprised of organic silsesquioxane (OSQ) have been developed. The OSQ showed high photosensitivity, insulating performance, transparency, and heat resistance required as a passivation layer on TFT LCDs. We examined features on the photolithographic and electric properties. The higher photosensitivity and resolution were obtained by the improvement of the material composition of OSQ. And we discussed the further evaluation of the V-g-I-d and V-ds-I-d characteristics on TFT devices.
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页码:1299 / 1302
页数:4
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