Novel positive type photosensitive insulating materials by organic/inorganic hybrid technologies as a passivation layer on TFT LCDs

被引：0
|
作者：
Kusaka, Yasunari [1 ]
Nakamura, Shigeru [1 ]
Azuma, Kenichi [1 ]
Sasaki, Taku [1 ]
Unate, Takao [1 ]
Nakatani, Yasuhiro [1 ]
Nakasuga, Akira [1 ]
Matsukawa, Kimihiro [2 ]
Murakami, Shuichi [3 ]
Ohkura, Kensaku [4 ]
Kikkawa, Takamaro [4 ]
机构：
[1] Sekisui Chem Co Ltd, Minase Res Labs, Osaka, Japan
[2] Osaka Municipal Tech Res Inst, Osaka, Japan
[3] Technol Res Inst Osaka Prefecture, Osaka, Japan
[4] Res Ctr Nanodevices & Syst, Hiroshima, Japan
来源：
2007 SID INTERNATIONAL SYMPOSIUM, DIGEST OF TECHNICAL PAPERS, VOL XXXVIII, BOOKS I AND II | 2007年 / 38卷
关键词：
D O I：
10.1889/1.2785311
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
In this paper, we describe a novel positive type photosensitive silica-based spin on glass (SOG) material. This material is made by organic/inorganic hybrid technologies cat? provide good performances of high insulating resistance, transparency, and heat resistance. This material could be used as a passivation layer on TFT LCDs. and provide a novel vacuum-less process.
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页码：377 / +
页数：2
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