Thermal annealing induced competition of oxidation and grain growth in nickel thin films

被引：13

作者：

Raghavan, Lisha ^{[1
]}

Ojha, Sunil ^{[1
]}

Sulania, Indra ^{[1
]}

Mishra, N. C. ^{[2
]}

Ranjith, K. M. ^{[3
]}

Baenitz, M. ^{[3
]}

Kanjilal, D. ^{[1
]}

机构：

[1] Inter Univ Accelerator Ctr, New Delhi 110067, India

[2] Utkal Univ, Dept Phys, Bhubaneswar, India

[3] Max Planck Inst Chem Phys Solids, Nothnitzer Str 40, D-01187 Dresden, Germany

来源：

THIN SOLID FILMS | 2019年 / 680卷

关键词：

Nickel; Nickel oxide; Rutherford backscattering spectrometry; Magnetic domain; Field cooled measurements; Zero field cooled measurements; EXCHANGE BIAS; NI;

D O I：

10.1016/j.tsf.2019.04.034

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The interface of Ni-NiO thin films was developed by thermal evaporation of nickel and subsequent annealing in oxygen atmosphere at 400 degrees C at varying duration of time. The evolution of layer thicknesses with annealing time was studied using rutherford backscattering spectrometry. The structural characterization showed grain growth stagnation for Ni at higher duration of annealing. The Ni phase had more crystallinity compared to the NiO phase. The surface was studied using atomic force microscope. The magnetic domains were also imaged. Magnetic stripe domain patterns were observed for selected films. Variation in saturation magnetisation and coercivity with annealing time was observed. The observation of weak exchange bias shows the importance of antiferromagnetic phase in determining the exchange bias properties. Thermal annealing of Ni films caused a competition among oxidation and grain growth.

引用

页码：40 / 47

页数：8

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