Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system

被引：2

作者：

Zuo, Cuicui ^{[1
]}

Du, Yigang ^{[1
]}

Jiang, Tong ^{[1
]}

Nie, Zhiqiang ^{[1
]}

Zhang, Yanpeng ^{[1
,2
]}

Zheng, Huaibin ^{[1
]}

Gan, Chenli ^{[2
]}

Zhang, Weifeng ^{[1
]}

Lu, Keqing ^{[3
]}

机构：

[1] Xian Jiaotong Univ, Minist Educ, Key Lab Phys Elect & Devices, Xian 710049, Peoples R China

[2] Univ Arkansas, Dept Phys, Fayetteville, AR 72701 USA

[3] Chinese Acad Sci, Xian Inst Opt & Precis Mech, State Key Lab Transient Opt & Technol, Xian 710068, Peoples R China

来源：

CHINESE OPTICS LETTERS | 2008年 / 6卷 / 09期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.3788/COL20080609.0685

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We study the co-existing four-wave mixing (FWM) process with two dressing fields and the six-wave mixing (SWM) process with one dressing field in a five-level system with carefully arranged laser beams. We also show two kinds of doubly dressing mechanisms in the FWM process. FWM and SWM signals propagating along the same direction compete with each other. With the properly controlled dressing fields, the FWM signals can be suppressed, while the SWM signals have been enhanced.

引用

页码：685 / 688

页数：4

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