Emulation of Biological Synapse Characteristics from Cu/AlN/TiN Conductive Bridge Random Access Memory

被引:27
|
作者
Cho, Hyojong [1 ]
Kim, Sungjun [1 ]
机构
[1] Dongguk Univ, Div Elect & Elect Engn, Seoul 04620, South Korea
基金
新加坡国家研究基金会;
关键词
CBRAM; metal nitride; resistive switching; synaptic device; neuromorphic; THIN-FILMS; MECHANISM; BEHAVIOR; BIPOLAR; SI; DEVICE; SCLC;
D O I
10.3390/nano10091709
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Here, we present the synaptic characteristics of AlN-based conductive bridge random access memory (CBRAM) as a synaptic device for neuromorphic systems. Both non-volatile and volatile memory are observed by simply controlling the strength of the Cu filament inside the AlN film. For non-volatile switching induced by high compliance current (CC), good retention with a strong Cu metallic filament is verified. Low-resistance state (LRS) and high-resistance state (HRS) conduction follow metallic Ohmic and trap-assisted tunneling (TAT), respectively, which are supported by I-V fitting and temperature dependence. The transition from long-term plasticity (LTP) to short-term plasticity (STP) is demonstrated by increasing the pulse interval time for synaptic device application. Also, paired-pulse facilitation (PPF) in the nervous system is mimicked by sending two identical pulses to the CBRAM device to induce STP. Finally, potentiation and depression are achieved by gradually increasing the set and reset voltage in pulse transient mode.
引用
收藏
页码:1 / 11
页数:10
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