A combined QCM and XPS investigation of asphaltene adsorption on metal surfaces

被引:100
|
作者
Rudrake, Amit [1 ]
Karan, Kunal [1 ]
Horton, J. Hugh [2 ]
机构
[1] Queens Univ, Dept Chem Engn, Kingston, ON K7L 3N6, Canada
[2] Queens Univ, Dept Chem, Kingston, ON K7L 3N6, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
Asphaltene adsorption; Asphaltenes; Functional group; QCM and XPS; ADSORBED ASPHALTENES; CRUDE OILS; LIVE OILS; TOLUENE; PRECIPITATION; MICROSCOPY; SCATTERING; MOLECULES; KINETICS; RESINS;
D O I
10.1016/j.jcis.2008.12.052
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
To investigate asphaltene-metal interactions, a combined quartz crystal microbalance (QCM) and Xray photoelectron spectroscopy (XPS) study of asphaltene adsorption on a gold surface was conducted. Adsorption experiments were conducted at 25 degrees C with solutions of asphaltenes in toluene at concentrations ranging from 50 to 1500 ppm. QCM measurements yielded information on the kinetics of adsorption and further assessment of the data allowed the estimation of equilibrium adsorption levels. XPS analysis of adsorbed and bulk asphaltene demonstrated the presence of carboxylic, thiophenic, sulfide, pyridinic and pyrrolic type functional groups. The intensity of the main carbon (C-H) peak was related to surface coverage of adsorbed asphaltene as a function of asphaltene concentration by a simple mathematical model. The mass adsorption data from the QCM experiments also allowed estimation of the surface coverage, which was compared to those from XPS analyses. Surface coverage estimates as a function of asphaltene concentration could be described by a Langmuir (type-I) isotherm. The free energy of asphaltene adsorption was estimated to be -26.8 +/- 0.1 and -27.3 +/- 0.1 kJ/mol from QCM and XPS data, respectively assuming asphaltene molar mass of 750 g/gmol. QCM and XPS data was also analyzed to estimate adsorbed layer thickness after accounting for surface coverage. The thickness of the adsorbed asphaltene estimated from both XPS and QCM data analyses ranged from 6-8 nm over the entire range of adsorption concentrations investigated. (c) 2009 Elsevier Inc. All rights reserved.
引用
收藏
页码:22 / 31
页数:10
相关论文
共 50 条
  • [41] ADSORPTION ON METAL-SURFACES
    MATUURA, R
    JOURNAL OF JAPAN SOCIETY OF LUBRICATION ENGINEERS, 1979, 24 (06): : 357 - 360
  • [42] EXAFS and XPS study of arsenate adsorption on manganite (γ-MnOOH) surfaces
    Banerjee, Dipanjan
    Nelson, Hanna
    Persson, Per
    GEOCHIMICA ET COSMOCHIMICA ACTA, 2007, 71 (15) : A58 - A58
  • [43] XPS STUDY OF AMINO-ACID ADSORPTION TO TITANIUM SURFACES
    GOLD, JM
    SCHMIDT, M
    STEINEMANN, SG
    HELVETICA PHYSICA ACTA, 1989, 62 (2-3): : 246 - 249
  • [44] An XPS study of the adsorption of organic inhibitors on mild steel surfaces
    Olsson, COA
    Agarwal, P
    Frey, M
    Landolt, D
    CORROSION SCIENCE, 2000, 42 (07) : 1197 - 1211
  • [45] Adsorption and bioactivity of protein A on silicon surfaces studied by AFM and XPS
    Coen, MC
    Lehmann, R
    Gröning, P
    Bielmann, M
    Galli, C
    Schlapbach, L
    JOURNAL OF COLLOID AND INTERFACE SCIENCE, 2001, 233 (02) : 180 - 189
  • [46] Protein adsorption onto polystyrene surfaces studied by XPS and AFM
    Browne, MM
    Lubarsky, GV
    Davidson, MR
    Bradley, RH
    SURFACE SCIENCE, 2004, 553 (1-3) : 155 - 167
  • [47] ADSORPTION MAXIMA IN ANION ADSORPTION ON METAL SURFACES
    DREYER, I
    DREYER, R
    ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-LEIPZIG, 1967, 236 (1-2): : 107 - &
  • [48] Study of the adsorption of proteins on stainless steel surfaces using QCM-D
    Chandrasekaran, Neha
    Dimartino, Simone
    Fee, Conan J.
    CHEMICAL ENGINEERING RESEARCH & DESIGN, 2013, 91 (09): : 1674 - 1683
  • [49] AN XPS STUDY OF THE WATER-ADSORPTION DESORPTION CHARACTERISTICS OF TRANSITION-METAL OXIDE SURFACES - MICROELECTRONIC IMPLICATIONS
    LINN, JH
    SWARTZ, WE
    APPLICATIONS OF SURFACE SCIENCE, 1984, 20 (1-2): : 154 - 166
  • [50] XPS INVESTIGATION OF CDTE SURFACES - EFFECT OF RU MODIFICATION
    BOSE, DN
    HEDGE, MS
    BASU, S
    MANDAL, KC
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (10) : 866 - 870