Fabrication of high-aspect-ratio precision MEMS with LIGA using synchrotron radiation

LIGA is a microfabrication technology that enables the fabrication of ultraprecise deep microstructures, from hundreds to thousands of micrometers thick, with lateral dimensions in the micrometer range, and submicron tolerances in a variety of materials. It is a sequence of process steps combining deep X-ray lithography, plating-through-mask and replication. The first step of deep lithography in thick resist using synchrotron radiation will be emphasized. The replication techniques extend the applicability of LIGA by offering a broad spectrum of materials but also by allowing for low-cost volume application. Key technological areas receiving attention are materials base expansion, multilevel processing, formation of complex shapes, and assembly.