Critical evaluation of the potential of radiofrequency pulsed glow discharge-time-of-flight mass spectrometry for depth-profile analysis of innovative materials

The combination of radiofrequency pulsed glow discharge (RF-PGD) analytical plasmas with time-of-flight mass spectrometry (TOFMS) has promoted the applicability of this ion source to direct analysis of innovative materials. In this sense, this emerging technique enables multi-elemental depth profiling with high depth resolution and sensitivity, and simultaneous production of elemental, structural, and molecular information. The analytical potential and trends of this technique are critically presented, including comparison with other complementary and well-established techniques (e.g. SIMS, GD-OES, etc.). An overview of recent applications of RF-PGD-TOFMS is given, including analysis of nano-structured materials, coated-glasses, photovoltaic materials, and polymer coatings.