Excimer laser with high repetition rate for DUV lithography

被引：3
|
作者：
Patzel, R
Bragin, I
Kleinschmidt, J
Rebhan, U
Basting, D
机构：
[1] Lambda Physik GmbH, D-37079 Göttingen
来源：
MICROELECTRONIC ENGINEERING | 1996年 / 30卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(95)00219-7
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The 248nm wavelength of the KrF excimer laser is the accepted tool for the production of structures in the range of 0.25 mu m. When going to below 0.20 mu m, the even shorter excimer wavelength of 193nm will be used. The demands on the laser source have changed over the last years for both the reflective and the refractive Step&Scan tools. The cost-effective operation of such lithography tool requires excimer lasers with high power and repetition rates of greater than or equal to 1kHz. Precise dose control of the exposure requires high repetition rate and stability of the laser output energy.
引用
收藏
页码：165 / 167
页数：3
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