The influence of local order at a crystal-melt interface on the AIIIBV crystal growth

被引:0
|
作者
Skripnikov, V. A. [1 ]
Khukhryansky, Yu. P. [1 ]
Savchenko, V. A. [1 ]
Kartavykh, A. V. [2 ]
机构
[1] Voronezh State Tech Univ, Voronezh 394026, Russia
[2] Inst Chem Problems Microelect, Moscow 119017, Russia
关键词
growth models; interfaces; surface structure; liquid phase epitaxy; semiconducting III-V materials;
D O I
10.1016/j.jcrysgro.2008.04.051
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
An alternative approach to the study of crystallization process of the A(III)B(V) semiconductor compounds taking place at the "crystal-melt" interface has been considered in this paper. The influence of the short-range order in the interface region on the crystallization process has been studied at the atomic level. An elementary growth cell representing a system of five atoms, two of them are A(III) atoms belonging to a substrate, two other A atoms and the fifth B-V pertain to a solution-melt, has been proposed. Positions of the A(III) atoms belonging to the solution-melt are distributed in such a way that the resulting potential of the B-V atom proves to be double well. Transitions of the B-V atoms in such double-well potentials lead to crystallization. Taking the semiconductor compound GaP as an example, the potential energies of the pair interaction in the P-2, GaP and Ga-2 molecules are determined as functions of the interatomic distance. Based on these function dependences, the mean values of the double-well potential parameters are calculated. This allows to determine the mean rate of the elementary crystallization events at the interface. Some problems of the growing crystal morphology are discussed. (c) 2008 Elsevier B.V. All rights reserved.
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页码:3512 / 3516
页数:5
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