The effect of a surface layer capping p-InGaN/p-GaN superlattices on the contact to p-GaN

被引:2
|
作者
Yin, Yian [1 ]
Liu, Baolin [1 ]
Zhang, Baoping [1 ]
Lin, Guoxing [1 ]
机构
[1] Xiamen Univ, Dept Phys, Xiamen 361005, Peoples R China
关键词
P-InGaN/p-GaN SLs; polarization-induced effect; ohmic contact; CTLM;
D O I
10.1016/j.spmi.2007.08.003
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this study, the influence of the surface layer (p-InGaN or p-GaN) capping p-InGaN/p-GaN superlattices (SLs) on the contact to p-type GaN was investigated. It was found that the specific contact resistance (rho(c)) to p-type GaN is lower when using p-InGaN as the surface layer. The lowest value of p, was 1.99 x 10(-4) Omega cm(2) at room temperature. It was also found that low temperature growth of the p-GaN layers in the SLs is beneficial for lowering the ohmic contact resistance. Unlike Ni/Au deposited directly on p-GaN (without the strained p-InGaN/p-GaN SLs), Ni/Au deposited on p-InGaN/p-GaN SLs produces ohmic behavior even before annealing. (c) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码:162 / 167
页数:6
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