Chlorine- and Fluorine-based Dry Etching of Germanium-Tin

被引：0
|
作者：
Dong, Yuan [1 ]
Lei, Dian [1 ]
Xu, Xin [1 ]
Wang, Wei [1 ]
Yeo, Yee-Chia [1 ]
机构：
[1] Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117576, Singapore
来源：
2014 7TH INTERNATIONAL SILICON-GERMANIUM TECHNOLOGY AND DEVICE MEETING (ISTDM) | 2014年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：99 / 100
页数：2
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