We give a theoretical explanation of the very high electron-spin polarization measured in compressively strained Ge layers through spin-polarized photoemission experiments, based on the enhancement of the band orbital mixing between light-hole (LH) and split-off (SO) bands along the growth direction of Ge thin films. We deduce an increased valence-band mixing, with respect to the bulk case, from the measured spin-polarization values, which exceed the bulk limit when optical transitions away from the Gamma point of the tetragonally distorted Brillouin zone are taken into account. Furthermore, we show that the degree of LH-SO band orbital mixing is directly proportional to the degree of compressive strain in the Ge layer.
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Univ Jaume 1, Dept Quim Fis & Analit, E-12080 Castellon de La Plana, SpainUniv Jaume 1, Dept Quim Fis & Analit, E-12080 Castellon de La Plana, Spain
Segarra, C.
Climente, J. I.
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Univ Jaume 1, Dept Quim Fis & Analit, E-12080 Castellon de La Plana, SpainUniv Jaume 1, Dept Quim Fis & Analit, E-12080 Castellon de La Plana, Spain
Climente, J. I.
Planelles, J.
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Univ Jaume 1, Dept Quim Fis & Analit, E-12080 Castellon de La Plana, SpainUniv Jaume 1, Dept Quim Fis & Analit, E-12080 Castellon de La Plana, Spain
机构:
Laboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Laboratory for Nanometallurgy (LNM), Department of Materials Science, ETH Zurich
Electron Microscopy (EMEZ), ETH ZurichLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Süess M.J.
Geiger R.
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Laboratory for Micro-and Nanotechnology (LMN), Paul Scherrer InstitutLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Geiger R.
Minamisawa R.A.
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Laboratory for Micro-and Nanotechnology (LMN), Paul Scherrer InstitutLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Minamisawa R.A.
Schiefler G.
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Laboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Laboratory for Nanometallurgy (LNM), Department of Materials Science, ETH ZurichLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Schiefler G.
Frigerio J.
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L-NESS, Dip. di Fisica Del Politecnico di Milano, Polo di ComoLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Frigerio J.
Chrastina D.
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L-NESS, Dip. di Fisica Del Politecnico di Milano, Polo di ComoLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Chrastina D.
Isella G.
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L-NESS, Dip. di Fisica Del Politecnico di Milano, Polo di ComoLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Isella G.
Spolenak R.
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Laboratory for Nanometallurgy (LNM), Department of Materials Science, ETH ZurichLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Spolenak R.
Faist J.
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Institute for Quantum Electronics (QOE), ETH ZurichLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut
Faist J.
Sigg H.
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Laboratory for Micro-and Nanotechnology (LMN), Paul Scherrer InstitutLaboratory for Micro-and Nanotechnology (LMN), Paul Scherrer Institut