A non-invasive technique to determine ion fluxes and ion densities in reactive and non-reactive pulsed plasmas

A non-invasive diagnostic technique for measurements of ion fluxes and ion densities in low-pressure pulsed radio-frequency (RF) discharges is described. The ion flux towards an electrode is determined from the change in electrode dc-bias in the plasma afterglow. The measurements in various gas mixtures (Ar, N-2, Ar/C2H2 and Ar with nanoparticles) show an increase in ion flux with the applied RF power. Ion densities are estimated from the ion fluxes and the plasma density at the plasma-sheath boundary, assuming the afterglow electron temperature to be known. Very good agreement between the estimated ion densities and independently measured electron densities is found in the bulk of dust-free plasmas assuming an afterglow electron temperature of 0.05 eV for argon and argon/acetylene plasmas and 0.2 eV for the nitrogen plasma. In dusty plasmas, the ion density at the plasma-sheath boundary can be determined from the measured ion flux and assuming an afterglow electron temperature of 0.05 eV. For the estimation of ion density in the dusty plasma bulk, the ion density distribution, influenced by the negatively charged dust particles, has to be taken into account.