Patterning of nanomembranes with a Focused-Ion-Beam

被引：5

作者：

Matovic, J. ^{[1
]}

Kettle, J. ^{[2
]}

Brousseau, E. ^{[3
]}

Adamovic, N. ^{[1
]}

机构：

[1] Inst Sensors & Actuators, Fac Elect Engn Informat Technol, Vienna, Austria

[2] Univ Manchester, Sch Elect & Elect Engn, Microelect & Nanostruct Grp, Manchester M60 1QD, Lancs, England

[3] Cardiff Univ, Mfg Engn Ctr, Cardiff CF24 3AA, S Glam, Wales

来源：

2008 26TH INTERNATIONAL CONFERENCE ON MICROELECTRONICS, VOLS 1 AND 2, PROCEEDINGS | 2008年

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1109/ICMEL.2008.4559233

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A nanomembrane is a new MEMS/NEMS structural component. Most nanomembrane structures consist of a free-standing element, with a mean thickness between 5 and 30 nm. In contrast to its thickness, the lateral dimensions of a nanomembrane are in the range of 3 to 5 mm. In this paper, the fabrication of a new type of nanomembranes with a thickness of approximately 20 atomic layers and with a large area is presented. In addition, this study demonstrates that Focused-Ion Beam (FIB) can be applied successfully to the patterning of such nanomembranes.

引用

页码：103 / +

页数：2

共 50 条

[11] High-speed focused-ion-beam patterning for guiding the growth of anodic alumina nanochannel arrays
Liu, NW
Datta, A
Liu, CY
Wang, YL
APPLIED PHYSICS LETTERS, 2003, 82 (08) : 1281 - 1283
[12] FOCUSED-ION-BEAM FUSE CUTTING FOR REDUNDANCY TECHNOLOGY
KOMANO, H
OHMURA, Y
TAKIGAWA, T
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (07) : 899 - 903
[13] Sub-0.1 μm patterning characteristics of inorganic thin films by focused-ion-beam lithography
Lee, HY
Paek, SW
Chung, HB
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (12B): : 6792 - 6796
[14] LATERAL STRAGGLE OF FOCUSED-ION-BEAM IMPLANTED BE IN GAAS
VIGNAUD, D
ETCHIN, S
LIAO, KS
MUSIL, CR
ANTONIADIS, DA
MELNGAILIS, J
APPLIED PHYSICS LETTERS, 1992, 60 (18) : 2267 - 2269
[15] MODELING OF SPUTTERING AND REDEPOSITION IN FOCUSED-ION-BEAM TRENCH MILLING
ISHITANI, T
OHNISHI, T
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (06): : 3084 - 3089
[16] Magnetic nanoelements for magnetoelectronics made by focused-ion-beam milling
Xiong, G
Allwood, DA
Cooke, MD
Cowburn, RP
APPLIED PHYSICS LETTERS, 2001, 79 (21) : 3461 - 3463
[17] FABRICATION OF PERIODIC STRUCTURES IN GAAS BY FOCUSED-ION-BEAM IMPLANTATION
SHIOKAWA, T
ISHIBASHI, K
KIM, PH
AOYAGI, Y
TOYODA, K
NAMBA, S
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (12): : 2864 - 2867
[18] Simple calculation of topography of focused-ion-beam sputtered surface
Ishitani, Tohru, 1600, (28):
[19] Superconductivity of Freestanding Tungsten Nanofeatures Grown by Focused-Ion-Beam
Li, Wuxia
Gu, Changzhi
Warburton, P. A.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2010, 10 (11) : 7436 - 7438
[20] Channeling effects during focused-ion-beam micromachining of copper
Phillips, JR
Griffis, DP
Russell, PE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (04): : 1061 - 1065

← 1 2 3 4 5 →