Stress and grain growth in thin films

被引:440
|
作者
Thompson, CV
Carel, R
机构
[1] Dept. of Mat. Sci. and Engineering, Massachusetts Inst. of Technology, Cambridge
关键词
D O I
10.1016/0022-5096(96)00022-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The mechanical properties of polycrystalline thin films with thickness of 1 mu m or less depend strongly on the grain geometry, the grain size, and the way in which the crystallographic orientations of the grains are distributed. Grain growth during film formation or during post-deposition annealing can play a dominant role in defining these microstructural characteristics, and therefore, the mechanical properties of films. Stress can suppress or promote grain growth. In the latter case, stress promotes texture evolution during grain growth. Grain growth can serve as a stress relief mechanism in both elastically isotropic and anisotropic materials, and can also promote plastic yielding.
引用
收藏
页码:657 / 673
页数:17
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