A model for solid-state dewetting of a fully-faceted thin film

Owing to their extremely aspect ratios, most thin films are unstable and when they are heated, they will dewet or agglomerate to form islands. This process can occur in the solid state through capillary-driven surface self-diffusion. A key feature of the dewetting process is the retraction of the edges of the film, either natural edges, patterned edges, or edges where holes have formed. Models of edge retraction have been previously developed for isotropic materials and anisotropic materials with differentiable surfaces, but the effects of faceting in highly anisotropic materials have been largely unexplored. Here, we present a two-dimensional model of edge retraction for highly anisotropic, fully-faceted thin films. This model shows generally good agreement with experimental results for edge retraction of single-crystal Ni films on MgO. In both experiments and the model, rims form as the edges retract. The effects of adjusting various physical parameters on the edge retraction rate and the evolving rim geometry were explored using the model. The film thickness, surface self-diffusivity on the top facet of the rim, the equivalent contact angle of the film on the substrate, and the absolute value of the surface energies were found to be the factors that have the greatest influence on the edge retraction rate. In isotropic models and some experimental systems, valleys form ahead of the retracting rims and deepen to contact the substrate and cause pinch-off. Our model suggests that this form of pinch-off will not occur when the rim is fully faceted and the top surface is an equilibrium facet. However, pinch-off can occur through film thinning and for films with top surfaces that do not form flat equilibrium facets. (C) 2013 Academie des sciences. Published by Elsevier Masson SAS. All rights reserved.