Direct laser patterning on opaque substrate in two-photon polymerization

被引：12
|
作者：
Park, SH
Lim, TW
Yang, DY
Kong, HJ
Kim, JY
Lee, KS
机构：
[1] Korea Adv Inst Sci & Technol, Dept Mech Engn, Taejon 305701, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[3] Hannam Univ, Dept Polymer Sci & Engn, Taejon 306791, South Korea
来源：
MACROMOLECULAR RESEARCH | 2006年 / 14卷 / 02期
关键词：
D O I：
10.1007/BF03218517
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Direct patterning technique using two-photon polymerization (TPP) and top-down reverse (TDR) building technique was suggested for the fabrication of nano-patterns on opaque substrates without the use of photomasks. In this technique, two-dimensional complicated patterns could be fabricated directly using bitmap figures with a submicron resolution. Some patterns obtained by this technique demonstrated possible application to direct patterning for various MEMS applications.
引用
收藏
页码：245 / 250
页数：6
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