The effect of deposition parameters of multilayered nanostructure Ti-Al-N/Zr-Nb-N/Cr-N coatings obtained by the arc-PVD method on their structure and composition

The structure and elemental and phase compositions of the Ti-Al-N/Zr-Nb-N/Cr-N multi-layered coatings obtained by the arc-PVD method are investigated. A three-cathode sputtering system including the Ti-Al, Zr-Nb, and Cr cathodes was used for their deposition. The controlled parameters of the process were the rotation speed of coated samples relative to sputtered cathodes, the current of the sputtering arc on the zirconium-niobium cathode, and the negative electric bias potential supplied to the substrate. These parameters varied within the limits from 1 to 3 rpm, from 135 to 170 A, and from -80 to -160 V, respectively. The possibility of forming multilayered coatings with a thickness of single layers at a level of similar to 10 nm and their transfer from a multilayered structure to a single-layered one due to the variation in the deposition parameters is shown. The parametric dependences of the controlled parameters of the formation of coatings on their composition and structure components are found.