Effect of film thickness on surface morphology and optical properties of Nanostructured Zinc Aluminum Oxide thin films deposited by DC Magnetron Sputtering

被引：0
|
作者：
Kumar, B. Rajesh [1 ]
Rao, T. Subba [1 ]
机构：
[1] Sri Krishnadevaraya Univ, Mat Res Lab, Dept Phys, Anantapur 515055, Andhra Pradesh, India
来源：
INDIAN VACUUM SOCIETY SYMPOSIUM ON THIN FILMS: SCIENCE & TECHNOLOGY | 2012年 / 1451卷
关键词：
Thin films; DC reactive magnetron sputtering; Surface morphology; Optical band gap;
D O I：
10.1063/1.4732414
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Nanostructured Zinc Aluminum Oxide thin films were deposited on glass substrates by DC reactive magnetron sputtering in an Ar + O-2 gas mixture using commercially available Zn metal (99.999% purity) and Al (99.99% purity) targets. Scanning Electron Microscope (SEM) images of Zinc Aluminum Oxide thin films shows that the grain sizes are in the range of 18-40 nm, while the optical transmittance is found to be dependent on film thickness. Optical constants such as absorption coefficient (alpha), extinction coefficient (k), and optical band gap (E-g) are evaluated from the transmission spectra.
引用
收藏
页码：200 / 202
页数：3
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