Thermal, mechanical, and electrical study of voiding in the solder die-attach of power MOSFETs

被引:0
|
作者
Katsis, DC [1 ]
vanWyk, JD
机构
[1] USA, Res Lab, AMSRL, SE,DP, Adelphi, MD 20742 USA
[2] Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Ctr Power Elect Syst, Blacksburg, VA 24061 USA
基金
欧洲研究理事会; 美国国家科学基金会;
关键词
die-attach; hot-spots; power electronics; thermal degradation;
D O I
10.1109/TCAPT.2005.853301
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Large area die-attach defects have been shown to increase the thermal impedance of power semiconductor devices. The changes in thermal performance are simulated and measured in the silicon die using one-, two-, and three-dimensional methods. Experimental measurements for devices with various levels of die-attach void growth are presented. This data is then correlated with finite element thermal modeling to improve the estimate of peak die temperature for voided semiconductor devices. The results present a complete understanding of the heat flow within the voided semiconductor package with an estimate of its impact on performance over its lifetime.
引用
收藏
页码:127 / 136
页数:10
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