Fabrication of highly transparent self-cleaning protection films for photovoltaic systems

被引:38
|
作者
Lee, Seong-Hwan [1 ]
Han, Kang-Soo [1 ]
Shin, Ju-Hyeon [1 ]
Hwang, Seon-Yong [1 ]
Lee, Heon [1 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136713, South Korea
来源
PROGRESS IN PHOTOVOLTAICS | 2013年 / 21卷 / 05期
关键词
solar cell; anti-reflection; nano-pattern; UV nanoimprint; hot-embossing; moth-eye pattern; superhydrophobicity; external quantum efficiency; SOLAR-CELLS; ANTIREFLECTION; PERFORMANCE; SURFACES; EXPOSURE; GLASS;
D O I
10.1002/pip.2203
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
A moth-eye anti-reflective structure was fabricated by hot-embossing and UV nanoimprint lithography on a solar cell protective film to suppress the reflection of incident light. Moreover, a superhydrophobic surface was developed by reducing the surface energy by forming a hydrophobic self-assembled monolayer coating on an anti-reflective structured resin surface. Therefore, the transmittance of incident light was increased by the anti-reflective structure. As a result, the solar cell efficiency was enhanced and the total accumulated electrical energy generated by a solar cell with a nano-patterned polymeric film was increased. The efficiency of each solar cell was evaluated by an analysis of its I-V characteristics using a solar simulator, and the external quantum efficiency according to the wavelength of incident light was analyzed by using an incident photon-to-current conversion efficiency system. Finally, the enhancement of the generated power was confirmed by a field test and a power charging experiment. Copyright (c) 2012 John Wiley & Sons, Ltd.
引用
收藏
页码:1056 / 1062
页数:7
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