Optimal conditions for thermal fixing of volume holograms in Fe:LiNbO3 crystals

被引：7
|
作者：
Hsieh, CR [1 ]
Lin, SH
Hsu, KY
Hsieh, TC
Chiou, A
Hong, J
机构：
[1] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu, Taiwan
[2] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 30050, Taiwan
[3] Natl Dong Hwa Univ, Inst Elect Engn, Hwa Lien, Taiwan
[4] Rockwell Int Sci Ctr, Thousand Oaks, CA 91360 USA
来源：
APPLIED OPTICS | 1999年 / 38卷 / 29期
关键词：
D O I：
10.1364/AO.38.006141
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We analyze and compare two typical recording and thermal fixing procedures of a volume hologram in a Fe:LiNbO3 crystal (low-high-low procedure and high-low procedure). We consider the kinetics of the recording, compensating, and developing processes by taking into account the ratio of the conductivities between the protons and the electrons as a function of temperature. From the analysis the optimal environmental conditions tin terms of the fixing temperature and the compensation time) for each fixing procedure can be deduced for a crystal with given material parameters. (C) 1999 Optical Society of America.
引用
收藏
页码：6141 / 6151
页数：11
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