Electron emission characteristics of polycrystalline diamond films

被引：0
|
作者：
Sugino, T
Kawasaki, S
Yokota, Y
Iwasaki, Y
Shirafuji, J
机构：
来源：
IVMC'97 - 1997 10TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST | 1997年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Electron emission characteristics have been investigated for polycrystalline diamond films. O-2 plasma treatment or annealing of the diamond surface leads to an increase of the electric field commencing electron emission in comparison with that for H-2 plasma treated one. Emission characteristics are recovered by H-2 plasma treatment after O-2 plasma treatment or annealing. An increase of the electric field also occurs for diamond /Au samples in which the rear face of the diamond film is treated with O-2 plasma or annealed. However, MO recovery of the electric field occurs even though H-2 plasma treatment is carried out at the rear face after O-2 plasma treatment or annealing. It is demonstrated that there exists another factor dominating the field emission characteristic other than field emission mechanisms such as electron injection at the diamond/metal contact and electron emission at the surface with negative electron affinity.
引用
收藏
页码：513 / 517
页数：5
相关论文
共 50 条
  • [1] Electron emission characteristics of polycrystalline diamond films
    Sugino, T
    Kawasaki, S
    Yokota, Y
    Iwasaki, Y
    Shirafuji, J
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (02): : 720 - 723
  • [2] Electron emission characteristics of P-doped polycrystalline diamond films
    Kuriyama, K
    Kawasaki, S
    Sugino, T
    [J]. DIAMOND FILMS AND TECHNOLOGY, 1997, 7 (5-6): : 356 - 356
  • [3] Field emission characteristics of polycrystalline diamond films
    Kawasaki, S
    Kimura, C
    Kuriyama, K
    Yokota, Y
    Sugino, T
    [J]. DIAMOND FILMS AND TECHNOLOGY, 1997, 7 (5-6): : 365 - 365
  • [4] Electron field emission from polycrystalline diamond films
    Qing Zhang
    S. F. Yoon
    J. Ahn
    Bo Gan
    [J]. Journal of Materials Research, 2000, 15 : 212 - 217
  • [5] Electron field emission from polycrystalline diamond films
    Zhang, Q
    Yoon, SF
    Ahn, J
    Gan, B
    Rusli
    [J]. JOURNAL OF MATERIALS RESEARCH, 2000, 15 (01) : 212 - 217
  • [6] Growth of polycrystalline diamond films for low field electron emission
    Malcher, V
    Kromka, A
    Janík, J
    Dubravcová, V
    [J]. ASDAM 2000: THIRD INTERNATIONAL EUROCONFERENCE ON ADVANCED SEMICONDUCTOR DEVICES AND MICROSYSTEMS - CONFERENCE PROCEEDINGS, 2000, : 209 - 213
  • [7] Secondary electron emission characteristics of single-crystal and polycrystalline diamond
    Yater, JE
    Shih, A
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (11) : 8103 - 8112
  • [8] Secondary electron emission characteristics of single-crystal and polycrystalline diamond
    [J]. 1600, American Inst of Physics, Woodbury, NY, USA (87):
  • [9] The influence of surface conditioning on the thermionic electron emission from polycrystalline diamond films
    Bar-Hama, O. Reinharz
    Akhvlediani, R.
    Hoffman, A.
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2012, 209 (09): : 1690 - 1696
  • [10] The impact of surface hydrogenation on the thermionic electron emission from polycrystalline diamond films
    Elfimchev, S.
    Michaelson, Sh.
    Akhvlediani, R.
    Chandran, M.
    Kaslasi, H.
    Hoffman, A.
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2014, 211 (10): : 2238 - 2243
12345