Shockwave-induced deformation of organic particles during laser shockwave cleaning

被引:9
|
作者
Kim, Tae Hoon [1 ]
Cho, Hanchul [1 ]
Busnaina, Ahmed [1 ]
Park, Jin-Goo [2 ]
Kim, Dongsik [3 ]
机构
[1] Northeastern Univ, NSF Nanoscale Sci & Engn Ctr High Rate Nanomfg, Boston, MA 02115 USA
[2] Hanyang Univ, Dept Mat Engn, Ansan 426791, South Korea
[3] POSTECH, Dept Mech Engn, Pohang 790784, South Korea
关键词
NANOPARTICLE REMOVAL; INDUCED PLASMA; ADHESION; HUMIDITY; WAVES;
D O I
10.1063/1.4818307
中图分类号
O59 [应用物理学];
学科分类号
摘要
Although the laser shockwave cleaning process offers a promising alternative to conventional dry-cleaning processes for nanoscale particle removal, its difficulty in removing organic particles has been an unexplained problem. This work elucidates the physics underlying the ineffectiveness of removing organic particles using laser shock cleaning utilizing polystyrene latex particles on silicon substrates. It is found that the shockwave pressure is high enough to deform the particles, increasing the contact radius and consequently the particle adhesion force. The particle deformation has been verified by high-angle scanning electron microscopy. The Maugis-Pollock theory has been applied to predict the contact radius, showing good agreement with the experiment. (C) 2013 AIP Publishing LLC.
引用
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页数:4
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