Three-dimensional molecular imaging using mass spectrometry and atomic force microscopy

被引：21

作者：

Wucher, Andreas ^{[1
]}

Cheng, Juan ^{[2
]}

Zheng, Leiliang ^{[2
]}

Willingham, David ^{[2
]}

Winograd, Nicholas ^{[2
]}

机构：

[1] Univ Duisburg Essen, Dept Phys, D-47048 Duisburg, Germany

[2] Penn State Univ, Dept Chem, University Pk, PA 16802 USA

来源：

APPLIED SURFACE SCIENCE | 2008年 / 255卷 / 04期

关键词：

Molecular depth profiling; 3-D imaging; Depth scale calibration;

D O I：

10.1016/j.apsusc.2008.05.246

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We combine imaging ToF-SIMS depth profiling and wide area atomic force microscopy to analyze a test structure consisting of a 300 nm trehalose film deposited on a Si substrate and pre-structured by means of a focused 15-keV Ga(+) ion beam. Depth profiling is performed using a 40-keV C(60)(+) cluster ion beam for erosion and mass spectral data acquisition. A generic protocol for depth axis calibration is described which takes into account both lateral and in-depth variations of the erosion rate. By extrapolation towards zero analyzed lateral area, an "intrinsic" depth resolution of about 8 nm is found which appears to be characteristic of the cluster-surface interaction process. (C) 2008 Elsevier B. V. All rights reserved.

引用

页码：984 / 986

页数：3

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