Transport behaviors in graphene field effect transistors on boron nitride substrate

被引:0
|
作者
Alarcon, A. [1 ]
Nguyen, V. Hung [1 ]
Berrada, S. [1 ]
Querlioz, D. [1 ]
Saint-Martin, J. [1 ]
Bournel, A. [1 ]
Dollfus, P. [1 ]
机构
[1] Univ Paris 11, CNRS, UMR8622, Inst Fundamental Elect, F-91405 Orsay, France
关键词
Graphene field-effect transistor; boron nitride; non-equilibrium Green's functions; short-channel effect; Dirac point;
D O I
暂无
中图分类号
TP301 [理论、方法];
学科分类号
081202 ;
摘要
We model the transport behavior of a top-gated graphene field-effect transistor where boron nitride is used as substrate and gate insulator material. Our simulation model is based on the non-equilibrium Green's function approach to solving a tight-binding Hamiltonian for graphene, self-consistently coupled with Poisson's equation. The analysis emphasizes the effects of the chiral character of carriers in graphene in the different transport regimes including Klein and band-to-band tunneling processes. We predict the possible emergence of negative differential conductance and investigate its dependence on the temperature and the BN-induced bandgap. Short-channel effects are evaluated from the analysis of transfer characteristics as a function of gate length and gate insulator thickness. They manifest through the shift of the Dirac point and the appearance of current oscillations at short gate length.
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页数:4
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