Experimental Study of Random Telegraph Noise in Trigate Nanowire MOSFETs

被引:6
|
作者
Ota, Kensuke [1 ]
Saitoh, Masumi [1 ]
Tanaka, Chika [1 ]
Matsushita, Daisuke [1 ]
Numata, Toshinori [1 ]
机构
[1] Toshiba Co Ltd, Corp Res & Dev Ctr, Adv LSI Technol Lab, Kawasaki, Kanagawa 2128582, Japan
关键词
Random telegraph noise (RTN); silicon nanowire transistor (NW Tr.); silicon-on-insulator (SOI); BIAS TEMPERATURE INSTABILITY; DEGRADATION; MODEL; 1/F;
D O I
10.1109/TED.2015.2471840
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Random telegraph noise (RTN) in trigate nanowire transistors (NW Tr.) is systematically studied with respect to the NW size dependence. Time to capture and emission, which is related to the characteristic of the traps, such as trap energy, is independent of NW size. On the other hand, noise amplitude increases as the NW size decreases showing the similar size dependence to the reported scaled planar Tr. In addition, RTN after hot-carrier injection (HCI) and negative bias stress (NBS) is studied. HCI and NBS induce additional carrier traps, which generate larger noise signals. Since the degradation by HCI or NBS is larger with narrower width, RTN after these stresses is found to be severer in the NW Tr.
引用
收藏
页码:3799 / 3804
页数:6
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