Effects of catalyst film thickness on plasma-enhanced carbon nanotube growth (vol 98, pg 034308, 2005)

被引：0
|
作者：
Hofmann, S [1 ]
Cantoro, M
Kleinsorge, B
Casiraghi, C
Parvez, A
Robertson, J
Ducati, C
机构：
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[2] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
来源：
JOURNAL OF APPLIED PHYSICS | 2006年 / 99卷 / 03期
关键词：
D O I：
10.1063/1.2171441
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
下载
收藏
页数：1
相关论文
共 50 条
  • [1] Effects of catalyst film thickness on plasma-enhanced carbon nanotube growth
    Hofmann, S
    Cantoro, M
    Kleinsorge, B
    Casiraghi, C
    Parvez, A
    Robertson, J
    Ducati, C
    JOURNAL OF APPLIED PHYSICS, 2005, 98 (03)
  • [2] Effects of catalyst film thickness on plasma-enhanced carbon nanotube growth
    Hofmann, S.
    Cantoro, M.
    Kleinsorge, B.
    Casiraghi, C.
    Parvez, A.
    Robertson, J.
    Ducati, C.
    Journal of Applied Physics, 2005, 98 (03):
  • [3] Low-temperature growth of carbon nanotube by plasma-enhanced chemical vapor deposition using nickel catalyst
    Ryu, KM
    Kang, MY
    Kim, YD
    Jeon, HT
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (6A): : 3578 - 3581
  • [4] Low-temperature growth of carbon nanotube by plasma-enhanced chemical vapor deposition using nickel catalyst
    Ryu, Kyoungmin
    Kang, Mihyun
    Kim, Yangdo
    Jeon, Heyongtag
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2003, 42 (6 A): : 3578 - 3581
  • [5] Growth of vertically aligned carbon nanotubes depending on thickness of catalyst films by plasma-enhanced chemical vapor deposition
    Okuyama, Hiroki
    Iwata, Nobuyuki
    Yamamoto, Hiroshi
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2007, 472 (209/[599]-216/[606]) : 599 - 606
  • [6] Role of plasma activation in kinetics of carbon nanotube growth in plasma-enhanced chemical vapor deposition
    Kintech Lab Ltd., Moscow 123182, Russia
    不详
    不详
    不详
    J Appl Phys, 2012, 7
  • [7] Role of plasma activation in kinetics of carbon nanotube growth in plasma-enhanced chemical vapor deposition
    Lebedeva, Irina V.
    Knizhnik, Andrey A.
    Gavrikov, Alexey V.
    Baranov, Alexey E.
    Potapkin, Boris V.
    Smith, David J.
    Sommerer, Timothy J.
    JOURNAL OF APPLIED PHYSICS, 2012, 111 (07)
  • [8] The growth mode change in carbon nanotube synthesis in plasma-enhanced chemical vapor deposition
    Song, IK
    Cho, YS
    Choi, GS
    Park, JB
    Kim, DJ
    DIAMOND AND RELATED MATERIALS, 2004, 13 (4-8) : 1210 - 1213
  • [9] Preparation of dense carbon nanotube film using microwave plasma-enhanced chemical vapor deposition
    Taniguchi, M
    Nagao, H
    Hiramatsu, M
    Ando, Y
    Hori, M
    DIAMOND AND RELATED MATERIALS, 2005, 14 (3-7) : 855 - 858
  • [10] Analysis of oxidation state of multilayered catalyst thin films for carbon nanotube growth using plasma-enhanced chemical vapor deposition
    Okita, Atsushi
    Ozeki, Atsushi
    Suda, Yoshiyuki
    Nakamura, Junji
    Oda, Akinori
    Bhattacharyya, Krishnendu
    Sugawara, Hirotake
    Sakai, Yosuke
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (10 B): : 8323 - 8329
12345