Magnetron sputtering was used to prepare substrate//(Ni80Fe20)(60)Cr-40/[Co90Fe10/Cu] (n) /Cr superlattices containing permalloy-chromium buffer layer of different thicknesses. To achieve a maximum magnetoresistance of the superlattices, the thickness of their layers has been optimized. The use of the (Ni80Fe20)(60)Cr-40 buffer layer was found to result in the formation a more perfect crystal structure of subsequent layers of the superlattice compared to that of superlattices with the Cr and Co90Fe10 buffer layers. The superlattice with the optimum thickness of the (Ni80Fe20)(60)Cr-40 buffer layer and thin copper layers, the thickness of which is t (Cu) = 9.5 , demonstrates the giant magnetoresistance effect equal to 54% at room temperature.
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Univ Tehran, Coll Engn, Adv Magnet Mat Res Ctr, Sch Met & Mat, Tehran 111554563, IranUniv Tehran, Coll Engn, Adv Magnet Mat Res Ctr, Sch Met & Mat, Tehran 111554563, Iran
Khosravi, Payam
Seyyed Ebrahimi, Seyyed Ali
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Univ Tehran, Coll Engn, Adv Magnet Mat Res Ctr, Sch Met & Mat, Tehran 111554563, IranUniv Tehran, Coll Engn, Adv Magnet Mat Res Ctr, Sch Met & Mat, Tehran 111554563, Iran
Seyyed Ebrahimi, Seyyed Ali
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Lalegani, Zahra
Hamawandi, Bejan
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KTH Royal Inst Technol, Dept Appl Phys, SE-10691 Stockholm, SwedenUniv Tehran, Coll Engn, Adv Magnet Mat Res Ctr, Sch Met & Mat, Tehran 111554563, Iran
机构:E China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R China
Zhang, Q.
Mao, Q. M.
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E China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R ChinaE China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R China
Mao, Q. M.
Ruan, J. Z.
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E China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R ChinaE China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R China
Ruan, J. Z.
Wang, Q. J.
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E China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R ChinaE China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R China
Wang, Q. J.
Yang, X. L.
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E China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R ChinaE China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R China
Yang, X. L.
Zhao, Z. J.
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E China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R ChinaE China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R China
Zhao, Z. J.
Seet, H. L.
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Natl Univ Singapore, Dept Mech Engn, Singapore 119260, SingaporeE China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R China
Seet, H. L.
Li, X. P.
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Natl Univ Singapore, Dept Mech Engn, Singapore 119260, SingaporeE China Normal Univ, Engn Res Ctr Nanophoton & Adv Instrument, Minist Educ, Dept Phys, Shanghai 200062, Peoples R China