Hard Magnetic Materials for MEMS Applications

被引:19
|
作者
Dempsey, Nora M. [1 ]
机构
[1] UJF, CNRS, Inst Neel, F-38042 Grenoble, France
关键词
SPUTTERED NDFEB-FILMS; PERMANENT-MAGNETS; HIGH COERCIVITY; THIN-FILMS; ELECTRODEPOSITION; FABRICATION; ANISOTROPY; CODEPOSITION; ACTUATORS; MACHINES;
D O I
10.1007/978-0-387-85600-1_22
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Micro-magnets of thickness in the range 1-500 mu m have many potential applications in micro-electro-mechanical-systems (MEMS) because of favorable downscaling laws and their unique ability to produce long range bi-directional forces. The advantages and disadvantages of a number of "top-down" routes, which use bulk processed precursors (magnets or magnetic powders), to produce mu-magnets of thickness in the range 10-500 mu m will be discussed. Progress in the fabrication and patterning of thick film magnets (1-100 mu m) using "bottom-up" deposition techniques will be reviewed. In particular, recent results concerning high-rate triode sputtering and micro-patterning of high-performance NdFeB and SmCo films will be presented.
引用
收藏
页码:661 / 683
页数:23
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