Controlled particle generation in an inductively coupled plasma

被引：14
|
作者：
Schulze, M
von Keudell, A
Awakowicz, P
机构：
[1] Ruhr Univ Bochum, Arbeitsgrp Reakt Plasmen, D-44780 Bochum, Germany
[2] Ruhr Univ Bochum, Lehrstuhl Allgemeine Elektrotech & Plasmatech, D-44780 Bochum, Germany
来源：
APPLIED PHYSICS LETTERS | 2006年 / 88卷 / 14期
关键词：
D O I：
10.1063/1.2193041
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
By injecting pulses of acetylene into an inductive argon/helium discharge, carbon clusters with diameters in the range of 10-50 nm are produced. These particles cause an instability of the plasma, which becomes visible as an oscillation of the emission intensity. The particles are analyzed ex situ using atomic force microscopy and scanning electron micrographs. A unique linear dependence between particle size and oscillation time period is found. Thereby the oscillation phenomenon can serve as monitor signal to control the size of plasma produced particles.
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页数：3
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