Low loss high index contrast nanoimprinted polysiloxane waveguides

被引：35

作者：

Han, Ting ^{[1
]}

Madden, Steve ^{[1
]}

Zhang, Mathew ^{[1
]}

Charters, Robbie ^{[2
]}

Luther-Davies, Barry ^{[1
]}

机构：

[1] Australian Natl Univ, Laser Phys Ctr, Canberra, ACT 0200, Australia

[2] RPO Inc, Canberra, ACT 0200, Australia

来源：

OPTICS EXPRESS | 2009年 / 17卷 / 04期

基金：

澳大利亚研究理事会;

关键词：

FABRICATION; LAYER;

D O I：

10.1364/OE.17.002623

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Nanoimprint lithography is gaining rapid acceptance in fields as diverse as microelectronics and microfluidics due to its simplicity high resolution and low cost. These properties are critically important for the fabrication of photonic devices, where cost is often the major inhibiting deployment factor for high volume applications. We report here on the use of nanoimprint technology to fabricate low loss broadband high index contrast waveguides in a Polysiloxane polymer system for the first time. (C) 2009 Optical Society of America

引用

页码：2623 / 2630

页数：8

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