Analytical results for the I-V characteristics of a fully depleted SOI-MOSFET

被引:1
|
作者
Morris, H [1 ]
Cumberbatch, E
Tyree, V
Abebe, H
机构
[1] San Jose State Univ, Dept Math, San Jose, CA 95192 USA
[2] Claremont Grad Sch, Dept Math, Claremont, CA 91711 USA
[3] Univ So Calif, Inst Informat Sci, MOSIS, Marina Del Rey, CA 90292 USA
来源
关键词
D O I
10.1049/ip-cds:20050018
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Explicit formulae for the I-V characteristics of an SOI/SOS MOSFET operating in the fully depleted mode are derived by extending the asymptotic method of Ward. A detailed comparison with test data is presented and the model is shown to be effective over a range of device geometries for a half micrometre technology and voltages up to and including the kink attributable to impact ionisation.
引用
收藏
页码:630 / 632
页数:3
相关论文
共 50 条
  • [41] Analytical model of partially depleted SOI MOSFET based on BSIM3V3
    Li, Rui-Zhen
    Han, Zheng-Sheng
    Gongneng Cailiao yu Qijian Xuebao/Journal of Functional Materials and Devices, 2006, 12 (01): : 67 - 70
  • [42] Fully Analytical Compact Model for the I-V Characteristics of Large Radius Junctionless Nanowire FETs
    Ragi, Regiane
    Romero, Murilo Araujo
    IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2019, 18 : 762 - 769
  • [43] Modeling of Electron Tunneling in SOI-MOSFET and Its Influence on Device Characteristics
    Hayashi, T.
    Sadachika, N.
    Murakami, T.
    Sugiyama, D.
    Yukuta, S.
    Kusu, S.
    Johguchi, K.
    Miyake, M.
    Mattausch, H. J.
    Miura-Mattausch, M.
    Baba, S.
    Ida, J.
    2009 IEEE INTERNATIONAL SOI CONFERENCE, 2009, : 113 - +
  • [44] Comprehensive analytical charge control and I-V model of modern MOSFET's by fully comprising Quantum Mechanical Effects
    Ma, YT
    Liu, LT
    Tian, LL
    Yu, ZP
    Li, ZJ
    2000 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES, 2000, : 112 - 115
  • [45] Deep salicidation using nickel for suppressing the floating body effect in partially depleted SOI-MOSFET
    Deng, F
    Johnson, RA
    Dubbelday, WB
    Garcia, GA
    Asbeck, PM
    Lau, SS
    1996 IEEE INTERNATIONAL SOI CONFERENCE PROCEEDINGS, 1996, : 78 - 79
  • [46] New analytical HFET I-V characteristics model
    Sasic, RM
    Lukic, PM
    Ramovic, RM
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2006, 8 (01): : 324 - 328
  • [47] Simulation and analysis of fully depleted strained-Si SOI MOSFET
    Jing, Liu
    Yong, Gao
    Huang Yuan-Yuan
    2007 INTERNATIONAL SYMPOSIUM ON INTEGRATED CIRCUITS, VOLS 1 AND 2, 2007, : 143 - 145
  • [48] RF characterisation of fully depleted SOI MOSFET with Si substrate removed
    Chen, CL
    Burns, JA
    Warner, K
    Beard, WT
    ELECTRONICS LETTERS, 2002, 38 (05) : 256 - 257
  • [49] Noise modeling and performance in 0.15 μm fully depleted SOI MOSFET
    Pailloncy, G
    Iniguez, B
    Dambrine, G
    Dehan, M
    Raskin, JP
    Matsuhashi, H
    Delatte, P
    Danneville, F
    NOISE IN DEVICES AND CIRCUITS II, 2004, 5470 : 122 - 130
  • [50] Impact of gate resistance on RF performance of fully depleted SOI MOSFET
    Chen, CL
    Wyatt, PW
    Chen, CK
    Knecht, JM
    Yost, DR
    2006 TOPICAL MEETING ON SILICON MONOLITHIC INTEGRATED CIRCUITS IN RF SYSTEMS, DIGEST OF PAPERS, 2006, : 320 - +