Influence of Abrasive on Planarization Grinding Based on the Cluster Magnetorheological Effect

被引:0
|
作者
Yan, Qiusheng [1 ]
Yan, Jiewen [1 ]
Lu, Jiabin [1 ]
Gao, Weiqiang [1 ]
Li, Min [1 ]
机构
[1] Guangdong Univ Technol, Fac Electromech Engn, Guangzhou, Guangdong, Peoples R China
来源
关键词
Cluster MR-effect; Abrasive; Planarization grinding;
D O I
10.4028/www.scientific.net/AMR.325.542
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new planarization grinding method based on the cluster magnetorheological (MR) effect is presented to grind optical glass in this paper. Some process experiments were conducted to reveal the influence of the species and granularity and content of the abrasive materials in the MR fluid on the machining effect, furthermore, the machining characteristic of grinded surface was studied. The results indicate that the abrasive influences definitively on machining effect of this planarization grinding method based on the cluster MR-effect. Under the certain experiment condition, with the content of the abrasive 10% and grain size 800# of SiC, best machining effect can be achieved. The difference species of abrasive results in various machining effects. As for the removal rate of K9 optical glass: abrasive CeO2 is the best, the Al2O3 is the second and the SiC is the worst. While the surface roughness: abrasive SiC is the lowest, the Al2O3 is the second and CeO2 is the highest.
引用
收藏
页码:542 / 547
页数:6
相关论文
共 50 条
  • [21] Influence of magnets' phyllotactic arrangement in cluster magnetorheological effect finishing process
    Nie Meng
    Cao Jianguo
    Liu Yueming
    Li Jianyong
    INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY, 2018, 99 (5-8): : 1699 - 1712
  • [22] Grinding tools based on multicomponent abrasive
    Kryukov S.A.
    Russian Engineering Research, 2015, 35 (01) : 19 - 21
  • [23] Ultra Smooth Polishing Research Based on the Cluster Magnetorheological Effect
    Wu, Z. C.
    Yan, Q. S.
    Bai, Z. W.
    Kong, L. Y.
    Chai, J. F.
    ADVANCES IN GRINDING AND ABRASIVE TECHNOLOGY XVI, 2011, 487 : 283 - 288
  • [24] Effect of abrasive in Cu-CMP slurry on global planarization
    Nomura, Y
    Ono, H
    Terazaki, H
    Kamigata, Y
    Yoshida, M
    ADVANCES IN CHEMICAL-MECHANICAL POLISHING, 2004, 816 : 107 - 111
  • [25] Effect of nanosilica abrasive properties on tungsten chemical mechanical planarization
    Jingwei Zhang
    Gaoyuan Ren
    Li Wang
    Wenxiang Xie
    Deng Pan
    Hongjiu Su
    Shudong Wang
    Journal of Materials Science: Materials in Electronics, 2024, 35
  • [26] Effect of nanosilica abrasive properties on tungsten chemical mechanical planarization
    Zhang, Jingwei
    Ren, Gaoyuan
    Wang, Li
    Xie, Wenxiang
    Pan, Deng
    Su, Hongjiu
    Wang, Shudong
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2024, 35 (05)
  • [27] An ultra-smooth planarization method for controlling fluid behavior in cluster magnetorheological finishing based on computational fluid dynamics
    Luo, Bin
    Yan, Qiusheng
    Chai, Jingfu
    Song, Wenqing
    Pan, Jisheng
    PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2022, 74 : 358 - 368
  • [28] Effect of abrasive particles on mechanical properties of magnetorheological elastomer
    Xu, Zhiqiang
    Wang, Jun
    Wu, Heng
    Bo, Xinqian
    Tang, Zhifa
    Zhang, Gaofeng
    POLYMERS FOR ADVANCED TECHNOLOGIES, 2021, 32 (02) : 630 - 640
  • [29] GRINDING GLASS WITH AN INSTRUMENT BASED ON MAGNETORHEOLOGICAL LIQUIDS
    SHLYAGO, YI
    BIBIKOVA, NV
    EVSTISHENKOV, VS
    GLASS AND CERAMICS, 1980, 37 (3-4) : 123 - 125
  • [30] Effect of abrasive grinding on the strength and reliability of alumina
    Tuan, WH
    Kuo, JC
    JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 1998, 18 (07) : 799 - 806