Si-and C-rich structure of the 6H-SiC(0001) surface

被引:10
|
作者
Li, L [1 ]
Hasegawa, Y [1 ]
Sakurai, T [1 ]
机构
[1] TOHOKU UNIV,INST MAT RES,SENDAI,MIYAGI 98077,JAPAN
来源
关键词
D O I
10.1116/1.589455
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The reconstructions of the 6H-SiC(0001) surface under both Si-rich and C-rich conditions were studied using field ion-scanning tunneling microscopy (FI-STM). The sample was cleaned by in situ Si beam etching at 900-1000 degrees C. The as-cleaned surface showed a (root 3 x root 3) structure. The Si-rich phases were produced by annealing the sample in a Si flux, With increasing Si concentration, (2 x 2), (2 root 3 x 6 root 3), (3 x 3), and (7 x 7) reconstructions Were observed. Reaction of the Si-rich phases with C2H2 molecules at 1050 degrees C resulted in the formation of a C-rich surface, which exhibited a (2 x 2 )/(6 x 6) reconstruction. A structure model for (root 3 x root 3) reconstruction is proposed, and possible applications of using the surface reconstruction to selectively grow SIC polytype is discussed. (C) 1997 American Vacuum Society. [S0734-211X(97)01304-8].
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页码:1307 / 1309
页数:3
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